viernes, 3 de febrero de 2012

Fabrication of Nanosized Cuprous Oxide Using Fehling's Solution

A facile method for the synthesis of Cu2O nanoparticles by reduction of Fehling's solution, using glucose as reducing agent. Copper sulfate is used as a precursor with potassium sodium tartarate in an alkaline media to produce Fehling's solution. The precipitation of Cu2O nanoparticles from this solution in the presence of glucose was controlled by addition of SLES or Triton-X 100 as surfactants. The reactions have been carried out at 60_C with high repeatability. The purification process of the Cu2O product does not require expensive methods, since a solid product isobtained from a reaction in liquid phase.


  1. 1   CuSO4.5H2O,
  2. 2    Potassium sodium tartarate tetrahydrate,
  3. 3    Triton-X 100,
  4. 4    Sodium laureth sulfate
  5. 5    NaOH analytical grade

Preparation of Cu2O Nanoparticles

Fehling's solution which is comprised of equal parts of the following solutions was first made:
Solution 1: Was made by dissolving of copper (II) sulfate pentahydrate (6.9 g 0.02 mol) in distilled water (100 mL).
Solution 2: Was made by dissolving of potassium sodium tartarate tetrahydrate (34.6 g) and sodium hydroxide (12 g) in distilled water (100 mL).
50 mL of each of the above solutions were mixed together in a beaker and Triton X-100 or SLES (2 g) was added to the mixture and vigorously stirred for 15 m. To this mixture, aqueous solution containing 5 g of glucose in 50 mL water was added and the whole content was then heated at 60° under continuous stirring. A brick-red solid of Cu2O precipitated after a short period of reaction time. The solid was filtered off, washed with deionized water (3 times) and ethanol (2 times) and it was dried in an oven at 80°C for 3 h to afford nanosized Cu2O, 1.38 g (97% yield based n the used copper sulfate; each mole of copper sulfate produces 0.5 mole of Cu2O).

Tomado de :

Fabrication of Nanosized Cuprous Oxide Using Fehling's Solution
M. Kooti  and L. Matouri
Transaction F: Nanotechnology
Vol. 17, No. 1, pp. 73-78

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